International Journal Of Rf Technologies-research And Applications impact factor, indexing, ranking (2024)


international

Aim and Scope

The International Journal Of Rf Technologies-research And Applications is a research journal that publishes research in the field of Computer Science, Information Systems. This journal is published by the IOS PRESS. The ISSN of this journal is 1754-5730.

Also, please check the following important details about international journal of rf technologies-research and applications: Publisher, ISSN, Ranking, Indexing, Impact Factor (if applicable), Publication fee (APC), Review Time, and Acceptance Rate.

According to Clarivate's JCR, journals indexed in SCIE/SSCI have an impact factor.

The ISSN (International Standard Serial Number) is an 8-digit code used to uniquely identify journals. ISSN numbers are assigned by a network of ISSN National Centres, usually located at national libraries and coordinated by the ISSN International Centre based in Paris. The International Centre is an intergovernmental organization created in 1974 through an agreement between UNESCO and the French government.

Important Metrics

Journal Title: INTERNATIONAL JOURNAL OF RF TECHNOLOGIES-RESEARCH AND APPLICATIONS
Publisher: IOS PRESS
ISSN: 1754-5730
E-ISSN: 1754-5749
Language: English
Country of Publisher: NIEUWE HEMWEG 6B, AMSTERDAM, NETHERLANDS, 1013 BG
Subject: Computer Science, Information Systems

Indexing

The international journal of rf technologies-research and applications is indexed in:

An indexed journal means that the journal has gone through and passed a review process of certain requirements done by a journal indexer.

The Web of Science Core Collection includes the Science Citation Index Expanded (SCIE), Social Sciences Citation Index (SSCI), Arts & Humanities Citation Index (AHCI), and Emerging Sources Citation Index (ESCI).

Note: ESCI journals donot come with an impact factor. However, ESCI journals are evaluated every year and those who qualified are transferred to SCIE.


International Journal Of Rf Technologies-research And Applications Impact Factor 2024

The latest impact factor of international journal of rf technologies-research and applications is 1.6 which is recently updated in June, 2024.

The impact factor (IF) is a measure of the frequency with which the average article in a journal has been cited in a particular year. It is used to measure the importance or rank of a journal by calculating the times it's articles are cited.

Note: Every year, The Clarivate releases the Journal Citation Report (JCR). The JCR provides information about academic journals including impact factor. The latest JCR was released in June, 2023. The JCR 2024 will be released in the June 2024.


Journal Publication Time

The publication time may vary depending on factors such as the complexity of the research and the current workload of the editorial team. Journals typically request reviewers to submit their reviews within 3-4 weeks. However, some journals lack mechanisms to enforce this deadline, making it difficult to predict the duration of the peer review process.

The review time also depends upon the quality of the research paper.



Call for Papers

Visit to the official website of the journal/ conference to check the details about call for papers.

How to publish in International Journal Of Rf Technologies-research And Applications?

If your research is related to Computer Science, Information Systems, then visit the official website of international journal of rf technologies-research and applications and send your manuscript.

Tips for publishing in International Journal Of Rf Technologies-research And Applications:

Acceptance Rate

Acceptance rate is the ratio of the number of articles submitted to the number of articles published. Researchers can check the acceptance rate on the journal website. Alternatively, they can contact the editor of the journal.

Final Summary

  • The impact factor of international journal of rf technologies-research and applications is 1.6.
  • The international journal of rf technologies-research and applications is a reputed research journal.
  • It is published by IOS PRESS.
  • The journal is indexed in UGC CARE, ESCI.









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Credit and Source: Scopus, Clarivate, UGC CARE.